Langdao displays EUV source prototype with claimed output above 15W

Chinese startup Langdao Silex displayed an extreme ultraviolet light source prototype that it says produces over 15W, Tom's Hardware reported. Such sources generate radiation for semiconductor research by firing laser pulses at metal droplets to create plasma. The company says 90% of the prototype's components are domestically sourced. The prototype was displayed without operating. Langdao has not disclosed where it measures output, preventing direct comparison with sources measured after collection optics. Its output remains insufficient for high-volume chip production, although the technology could support photoresist development and optics research. A complete lithography scanner would require additional precision systems.